SAN JOSE, Calif.--(BUSINESS WIRE)--
Ultratech, Inc. (Nasdaq:UTEK), a leading supplier of lithography,
laser-processing and inspection systems used to manufacture
semiconductor devices and high-brightness LEDs (HB-LEDs), as well as
atomic layer deposition (ALD) systems, today announced that it will
present at the 19th Annual Needham Growth Conference on Tuesday, January
10, 2017 at 3:30pm ET at the Lotte New York Palace Hotel in New York, NY.
To listen to the audio webcast of this presentation during or after the
event, please visit http://ir.ultratech.com/.
The replay will be available for 30 days following the event.
About Ultratech: Ultratech, Inc. (Nasdaq: UTEK) designs, builds
and markets manufacturing systems for the global technology industry.
Founded in 1979, Ultratech serves three core markets: front-end
semiconductor, back-end semiconductor, and nanotechnology. The company
is the leading supplier of lithography products for bump packaging of
integrated circuits and high-brightness LEDs. Ultratech is also the
market leader and pioneer of laser spike anneal technology for the
production of advanced semiconductor devices. In addition, the company
offers solutions leveraging its proprietary coherent gradient sensing
(CGS) technology to the semiconductor wafer inspection market and
provides atomic layer deposition (ALD) tools to leading research
organizations, including academic and industrial institutions. Visit
Ultratech online at: www.ultratech.com.
View source version on businesswire.com: http://www.businesswire.com/news/home/20161220005805/en/
Bruce R. Wright, 408-321-8835
Vice President and CFO
Suzanne Schmidt, 415-217-4962
Source: Ultratech, Inc.
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